Project information
Study of plasmachemical processes using microwave and optical spectroscopy
- Project Identification
- GP202/01/P106
- Project Period
- 1/2001 - 1/2003
- Investor / Pogramme / Project type
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Czech Science Foundation
- Postdoctoral projects
- MU Faculty or unit
- Faculty of Science
Selected plasmachemical reactions in various types of discharges (low pressure radiofrequency discharge, low pressure DC discharge, low pressure microwave discharge, atmospheric pressure microwave torch, atmospheric pressure glow, etc.) will be studied b y means of electron paramagnetic resonance (EPR) spectroscopy and optical emission spectroscopy (OES). The project will concentrate on three main research topics: (i) influence of admixtures on heterogeneous reactions on the surface of a discharge tube, particularly the surface recombination of atoms. Concentration of selected atoms in the afterglow will be measured in dependence on amount of impurity, afterglow position, wall temperature, etc. The goal is to understand better this process, describe it both experimentally and theoretically and finally draw the conclusions about possible applications in industry (e.g. higher nitridation rate). (ii) Determination of rate constants of main reactions between organosilicon compounds (TEOS, HMDSO, HMDSZ, OMT
Publications
Total number of publications: 35
2003
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Improved calibration procedure of an RF plasma impedance probe
Proceedings of ISPC 14, year: 2003
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Increase od Dissociation Degree in Afterglow Due to Admixtures
Proceedings of the XIVth SAPP, year: 2003
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Increase of dissociation degree in afterglow due to admixtures
Acta Physica Slovaca, year: 2003, volume: vol. 53, edition: No. 5
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Interferometer Diagnostics of Nitrogen Microwave Pulse Discharge
Proceedings of the XIVth SAPP, year: 2003
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Optical Diagnostics of ICP Dischare During Synthesis of Tungsten Carbide
Proceedings of the XIV Symposium on Application of Plasma Processes, year: 2003
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Study of high power pulsed microwave discharge
Microwave discharges: fundamentals and applications, year: 2003
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Study of high power pulsed microwave discharge
Microwave discharges: Fundamentals and applications, year: 2003
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Study of reaction between HMDSO and O atoms in afterglow
Proceedings of ISPC 14, year: 2003
2002
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Advanced methods for deposition of thin films: monitoring, properties, application
Year: 2002, number of pages: 157 s.
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Changes in concentration of atoms in afterglow due to presence of admixtures
Proceedings of ESCAMPIG and ICRP, year: 2002