Project information
Study of plasmachemical processes using microwave and optical spectroscopy
- Project Identification
- GP202/01/P106
- Project Period
- 1/2001 - 1/2003
- Investor / Pogramme / Project type
-
Czech Science Foundation
- Postdoctoral projects
- MU Faculty or unit
- Faculty of Science
Selected plasmachemical reactions in various types of discharges (low pressure radiofrequency discharge, low pressure DC discharge, low pressure microwave discharge, atmospheric pressure microwave torch, atmospheric pressure glow, etc.) will be studied b y means of electron paramagnetic resonance (EPR) spectroscopy and optical emission spectroscopy (OES). The project will concentrate on three main research topics: (i) influence of admixtures on heterogeneous reactions on the surface of a discharge tube, particularly the surface recombination of atoms. Concentration of selected atoms in the afterglow will be measured in dependence on amount of impurity, afterglow position, wall temperature, etc. The goal is to understand better this process, describe it both experimentally and theoretically and finally draw the conclusions about possible applications in industry (e.g. higher nitridation rate). (ii) Determination of rate constants of main reactions between organosilicon compounds (TEOS, HMDSO, HMDSZ, OMT
Publications
Total number of publications: 35
2005
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Hydrogen line broadening in afterglow observed by means of EPR
15th Symposium of Applications of Plasma Processes - Book of Contributed Papers, year: 2005
2004
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Electron density measurements in afterglow of high power pulsed microwave discharge
Plasma Sources Sci. Technol., year: 2004, volume: 13, edition: 4
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Low Temperature Metallurgy of Tungsten in Plasma Reactors
Journal of advanced oxidation technologies, year: 2004, volume: 7, edition: 1
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Simultaneous determination of N and O atom density in N2 - O2 plasma afterglow by NO titration
Proceeding of Seventeenth European Conference on Atomic & Molecular Physics of Ionized Gases, year: 2004
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Simultaneous measurement of N and O densities in plasma afterglow by means of NO titration
Plasma Sources Sci. Technol., year: 2004, volume: 13, edition: 4
2003
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Deposition of Hard carbon films and Its Diagnostics
Proceedings of the XIVth SAPP, year: 2003
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Diamond Growth on silicon and WC-Co by microwave plasma chemical vapor deposition
Proceedings of contributed papers WDS'03, year: 2003
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Electron density measurements in pulsed microwave discharge in nitrogen gas
Proceedings of contributed papers WDS'03, year: 2003
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Film deposition in Parallel Plate RF Discharges Containing Hydrocarbons
Proceedings of ISPC 14, year: 2003
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Hard carbon films: Deposition and diagnostics
Acta Physica Slovaca, year: 2003, volume: vol. 53, edition: No. 5