Project information
Optimization of magnetron discharge and spatial study of deposition plasma for efficient deposition processes

The first aim of the project is to study the effects of process parameters such as substrate holder loading (full and partial), number of rotation axes (1, 2, 3) or carousel configuration (6, 7 and 14 positions), and type of cathode (Cr, Ti, Zr etc.) used on the properties of the generated plasma and on layer formation during magnetron sputtering. These findings will contribute to improving the quality of deposited thin layers and enable better reproducibility and optimisation of process parameters. The second aim is a PVD coating for precision machining with increased tool-lifetime and other requirements (low roughness, machinig speed and material). It will be based on chromium and titanium nitrides in combination with other elements (e.g., Al, Si, etc.) prepared by magnetron sputtering, the parameters of which will be based on the results of the first aim.