Mgr. Pavel Ondračka, Ph.D.
Researcher II, Deposition of Thin films and Nanostructures
Total number of publications: 25
2025
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Influence of oxygen flow on the structure, chemical composition, and dielectric strength of AlxTayOz thin films deposited by pulsed-DC reactive magnetron sputtering
Surface and Coatings Technology, year: 2025, volume: 498, edition: February, DOI
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Wide spectral range optical characterization of terbium gallium garnet (TGG) single crystal by universal dispersion model
Optics and Laser Technology, year: 2025, volume: 181, edition: February, DOI
2024
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Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications
Vacuum, year: 2024, volume: 221, edition: March, DOI
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Bond Formation at Polycarbonate | X Interfaces (X = Al2O3, TiO2, TiAlO2) Studied by Theory and Experiments
Advanced Materials Interfaces, year: 2024, volume: 11, edition: 30, DOI
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Effect of Nb incorporation in Mo BC coatings on structural and mechanical properties — Ab initio modelling and experiment
Acta Materialia, year: 2024, volume: 268, edition: April 2024, DOI
2023
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Correlative Theoretical and Experimental Study of the Polycarbonate | X Interfacial Bond Formation (X = AlN, TiN, (Ti,Al)N) During Magnetron Sputtering
Advanced Materials Interfaces, year: 2023, volume: 10, edition: 29, DOI
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NOMAD: A distributed web-based platform for managing materials science research data
Journal of Open Source Software, year: 2023, volume: 8, edition: 90, DOI
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On the determination of the thermal shock parameter of MAX phases: A combined experimental-computational study
Journal of the European Ceramic Society, year: 2023, volume: 43, edition: 13, DOI
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Phase formation of powders sputtered from X2BC targets and XC+XB powder mixtures {X = Nb, Ta, W}
Surface and Coatings Technology, year: 2023, volume: 458, edition: April, DOI
2022
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Ab initio-guided X-ray photoelectron spectroscopy quantification of Ti vacancies in Ti1-dOxN1-x thin films
Acta Materialia, year: 2022, volume: 230, DOI